- ADEKA corporation has more than 100 years of experience for chemicals.
Especially for the ALD and CVD material, ADEKA plays an important role in the Korean semiconductor industry in the leading position. -
ADEKA was founded in 1917, a chemical company with over 100 years of history. Since the manufacturing of high purity liquefied chlorine in 1981, with high purity gas and CVD materials, it has contributed to the development of various fields such as semiconductor FPD and optical communication.
In addition, the company has strengths in quality control, such as product refining technology, analysis technology, and cleaning maintenance technology for exclusive Canister, which have been secured through mass-production supply for more than 20 years.As the semiconductor sector becomes more sophisticated and dense, the demand for new materials is always increasing. So ADEKA takes an initiating role for the industry by developing new ALD/CVD materials. And the company is highly evaluated by domestic and foreign customers to develop a variety of original products such as High-K, electrode materials, and wiring materials.
ALD / CVD Precursors
| Use | Item | Element | Product | Appearance |
|---|---|---|---|---|
| High-k | Al₂O₃ | Al Aluminium | Al(mmp)₃ | Liquid |
| TMA : Alme₃ | Liquid | |||
| Ta₂O₅ | Ta Tantalum | TBTDET : t-BuN=Ta(NEt₂)₃ | Liquid | |
| TBTEMT : t-BuN=Ta(NEtMe)₃ | Liquid | |||
| NB₂O₅ | Nb Niobium | TBTDEN : t-BuN=Nb(NEt₂)₃ | Liquid | |
| TBTEMN : t-BuN=Nb(NEtMe)₃ | Liquid | |||
| HfO₂ | Hf Hafnium | Hf(MMP)₄ | Liquid | |
| HTTB : Hf(OtBu)₄ | Liquid | |||
| *TDMAH : Hf(NMe₂)₄ | Solid (m.p. 32℃) | |||
| ZrO₂ | Zr Zirconium | Zr(MMP)₄ | Liquid | |
| ZTTB : Zr(Ot-Bu)₄ | Liquid | |||
| TiO₂ | Ti Titanium | Ti(MMP)₄ | Liquid | |
| TTTB : Ti(OT-Bu)₄ | Liquid | |||
| TEMAT : Ti(NEtMe)₄ | Liquid | |||
| Rare earth | Dy Dysprosium | Dy(EDMDD)₃ | Viscous liquid | |
| Dy(s-BuCp)₃ | Liquid | |||
| La Lanthanum | La(EDMDD)₃ | Solid (m.p. 150℃) | ||
| La(i-PrCp)₃ | Liquid | |||
| Pr Praseodymium | Pr(EDMDD)₃ | Solid (m.p. 150℃) | ||
| Pr(s-BuCp)₃ | Liquid | |||
| Sc Scandium | Sc(EDMDD)₃ | Viscous liquid | ||
| Y Yttrium | Y(s-BuCp)₃ | Liquid | ||
| Yb Yterbium | Yb(EDMDD)₃ | Viscous liquid | ||
| STO | Sr Strontium | Sr(METHD)₂ | Viscous liquid | |
| Ti Titanium | Ti(MPD)(THD)₂ | Viscous liquid | ||
| Ferroelectrics | BIT | Bi Bismuth | Bi(MMP)₃ | Solid (m.p. 49℃) |
| Ti Titanium | Ti(MMP)₄ | Liquid | ||
| Electride Barrier metal |
TiN | Ti Titanium | TiCl₄ | Liquid |
| TDMAT : Ti(NMe₂)₄ | Liquid | |||
| TEMAT : Ti(NEtMe)₄ | Liquid | |||
| Ru/RuO | Ru Ruthenium | Ru(OD)₃ | Viscous liquid | |
| Ru(EtCp)₂ | Liquid | |||
| Dielectric Film | SiO₂ | Si Silicon | Si(MMP)₄ | Liquid |
| TEOS : Si(OEt)₄ | Liquid | |||
| TICS : Si(NMe₂)₃ | Liquid | |||
| SiO₂/SiN | *TDMAS : HSi(NMe₂)₃ | Liquid | ||
| Low-k | TMCTS : (-Me(H)SiO-)₄ | Liquid | ||
| Optical Devices | ZnO | Zn Zinc | Zn(EDMDD)₂ | Liquid |
| Zu(OD)₂ | Liquid | |||
| High-Purity Solvent | ECH : Ethylcyclohexane | Liquid (b.p. 132℃) | ||
| Octane | Liquid (b.p. 126℃) |
Etching gas · Dielectric Film Materials
| Item | Product | Formula | Purity |
|---|---|---|---|
| Etching Gas | ADEKA HIGH PURITY CHLORINE | Cl₂ | ≧ 99.999 % |
| ADEKA HIGH-PURITY HYDROGRN BROMIDE | HBr | ≧ 99.999 % | |
| ADEKA HIGH-PURITY BORON TRICHLORIDE | BCl | ≧ 99.9999 % | |
| Dielectric Film | ADEKA SUPER TEOS | Si (OC₂H₅)₄ | ≧ 99.999995 % |
| Dopant | ADEKA HIGH-PURITY TMOP | PO (OCH₃)₃ | ≧ 99.999995 % |
| ADEKA HIGH-PURITY TEOP | PO (OC₂H₅)₃ | ≧ 99.999995 % | |
| ADEKA HIGH-PURITY TMB | B (OCH₃)₃ | ≧ 99.999995 % | |
| ADEKA HIGH-PURITY TEB | B (OC₂H₅)₃ | ≧ 99.999995 % |